- All sections
- C - Chemistry; metallurgy
- C23C - Coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general
- C23C 16/448 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
Patent holdings for IPC class C23C 16/448
Total number of patents in this class: 1277
10-year publication summary
83
|
80
|
90
|
96
|
107
|
116
|
99
|
121
|
148
|
31
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Tokyo Electron Limited | 11599 |
108 |
Applied Materials, Inc. | 16587 |
95 |
Lam Research Corporation | 4775 |
44 |
Entegris, Inc. | 1736 |
42 |
ASM IP Holding B.V. | 1715 |
41 |
L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude | 3515 |
34 |
HORIBA STEC, Co., Ltd. | 302 |
28 |
Shin-Etsu Chemical Co., Ltd. | 5132 |
21 |
Fujikin Incorporated | 671 |
20 |
Commissariat à l'énergie atomique et aux energies alternatives | 10525 |
19 |
Versum Materials US, LLC | 591 |
19 |
Kokusai Electric Corporation | 1791 |
19 |
Aixtron SE | 288 |
18 |
Beneq Oy | 205 |
15 |
Flosfia Inc. | 210 |
15 |
King Fahd University of Petroleum and Minerals | 779 |
15 |
Samsung Electronics Co., Ltd. | 131630 |
14 |
Samsung Display Co., Ltd. | 30585 |
13 |
Toshiba Mitsubishi-Electric Industrial Systems Corporation | 1583 |
13 |
Tokyo Electron America, Inc. | 97 |
11 |
Other owners | 673 |